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This week on Bench Boost Mike explains two key ICP-OES/ICP-MS quality control samples: the Initial Calibration Verification (ICV) and Continuing Calibration Verification (CCV). The ICV is run after calibration and before samples to confirm the calibration worked. The CCV is run periodically during the batch to confirm the calibration remains valid as drift, clogging, cone buildup, washout, or other issues occur. This episode concludes with reviewing how to troubleshoot ICV or CCV failures.

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This week Mike discusses elevated backgrounds in ICP-OES when analyzing high total dissolved solids (TDS) samples such as brines, digests, excipients, salts, and starting materials. TDS increases free electron density in the plasma, producing Bremsstrahlung (braking) radiation and recombination radiation, which raise a broad continuum background across the spectrum. The elevated background degrades signal-to-noise, increases blank standard deviation, and worsens detection limits, especially for elements with poor ICP-OES sensitivity. Mitigation approaches include dilution, matrix-matched calibration or standard additions when dilution isn’t feasible.

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Join Mike this week on Bench Boost as he explores the basics of conductivity measurements. We review the theory of how conductivity is dependent on ion concentration, charge, and mobility. He describes how contact probes work, emphasizing the cell constant and how proper probe selection to avoid poor sensitivity or signal saturation. Temperature is highlighted as a major variable, often ~2–3% per °C. Lastly we cover calibration using NIST-traceable KCl standards, and how calibrating near the sample range and controlling errors can lead to accurate and reliable data.